Auger- and X-Ray Photoelectron Spectroscopy in Materials Science: A User-Oriente

Description: Auger- and X-Ray Photoelectron Spectroscopy in Materials Science by Siegfried Hofmann Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. FORMAT Paperback LANGUAGE English CONDITION Brand New Publisher Description To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented. Back Cover To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented. Table of Contents Outline of the Technique/Brief Description.- Theoretical Background.- Instrumentation.- Practical Surface Analysis with AES.- Data Evaluation/Quantification.- Problem Solving with AES (Examples). Feature This is the most comprehensive book available on this widely used analytical technique Description for Sales People This book deals with an important surface analytical technique. It gives a textbook-like introduction to the basics, information on instrumentals and an introduction to applications and problem-solving. It is a must for all researchers and advanced students in this field. Details ISBN3642431739 ISBN-10 3642431739 ISBN-13 9783642431739 Format Paperback Author Siegfried Hofmann Imprint Springer-Verlag Berlin and Heidelberg GmbH & Co. K Subtitle A User-Oriented Guide Place of Publication Berlin Country of Publication Germany DEWEY 530.41 Short Title AUGER- & X-RAY PHOTOELECTRON S Language English Media Book Series Number 49 Birth 1930 Edition 2013th Illustrations XX, 528 p. Pages 528 Publisher Springer-Verlag Berlin and Heidelberg GmbH & Co. KG Edition Description 2013 ed. Series Springer Series in Surface Sciences Year 2014 Publication Date 2014-11-09 Alternative 9783642273803 Audience Professional & Vocational We've got this At The Nile, if you're looking for it, we've got it. With fast shipping, low prices, friendly service and well over a million items - you're bound to find what you want, at a price you'll love! TheNile_Item_ID:96378995;

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