Description: Auger- and X-Ray Photoelectron Spectroscopy in Materials Science Please note: this item is printed on demand and will take extra time before it can be dispatched to you (up to 20 working days). A User-Oriented Guide Author(s): Siegfried Hofmann Format: Hardback Publisher: Springer-Verlag Berlin and Heidelberg GmbH & Co. KG, Germany Imprint: Springer-Verlag Berlin and Heidelberg GmbH & Co. K ISBN-13: 9783642273803, 978-3642273803 Synopsis To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases ([url] contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.
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Book Title: Auger- and X-Ray Photoelectron Spectroscopy in Materials Science
Number of Pages: 528 Pages
Publication Name: Auger- and X-Ray Photoelectron Spectroscopy in Materials Science: a User-Oriented Guide
Language: English
Publisher: Springer-Verlag Berlin AND Heidelberg Gmbh & Co. KG
Item Height: 235 mm
Subject: Chemistry, Science
Publication Year: 2012
Type: Textbook
Item Weight: 9398 g
Subject Area: Mechanical Engineering
Author: Siegfried Hofmann
Item Width: 155 mm
Series: Springer Series in Surface Sciences
Format: Hardcover
